| ASIG |
Electroless Silver / Immersion Gold |
Semireductive gold. The reductive silver bath is described as unstable and the process has largely been replaced by ISIG. |
Ag + Au (thickness not stated in the source) |
— |
No |
— |
— |
| ENAG |
Electroless Nickel / Electroless Gold |
Phosphorous nickel; reductive gold chemistry is described as unstable and increasingly replaced by palladium alternatives. |
Ni 3–7 µm; Au 0.10–0.30 µm |
2× |
No |
140% |
Umicore |
| ENEPIG |
Electroless Nickel / Electroless Palladium / Immersion Gold |
Phosphorous nickel and palladium. A higher gold thickness can be produced with semireductive gold deposition. |
Ni 3–7 µm; Pd 0.05–0.30 µm; Au 0.04–0.10 µm |
3× |
No |
120% |
Atotech; Umicore (TRG) |
| ENIG |
Electroless Nickel / Immersion Gold |
Phosphorous nickel; established flat solderable finish for fine-pitch assembly. |
Ni 3–7 µm; Au 0.05–0.125 µm |
3× |
No |
100% reference |
OMG; Atotech; Umicore |
| ENIPIG |
Electroless Nickel / Immersion Palladium / Immersion Gold |
Phosphorous nickel and palladium. Higher gold thickness is possible when required. |
Ni 3–7 µm; Pd 0.01–0.05 µm; Au 0.04–0.10 µm |
3× |
No |
115% |
OMG; Umicore (TRG) |
| EP |
Electroless Palladium |
Palladium layer without phosphorus. |
Pd 0.10–0.20 µm |
3× |
No |
90% |
Atotech (Pallabond); Umicore |
| EPAG |
Electroless Palladium / Electroless Gold |
Palladium without phosphorus combined with semireductive gold. |
Pd 0.10–0.20 µm; Au 0.10–0.20 µm |
3× |
No |
125% |
Atotech (Pallabond) |
| EPIG |
Electroless Palladium / Semireductive Gold |
Palladium without phosphorus; intended for specialized bonding and functional applications. |
Pd 0.10–0.20 µm; Au 0.04–0.20 µm |
3× |
No |
125% |
Umicore (TRG) |
| GalvNiG hard |
Electroplated Nickel / Hard Gold |
Cobalt- or iron-doped gold bath. Nickel hardness 400–450 HV; gold hardness 140–170 HV. |
Ni >4 µm; Au 0.8–3.0 µm |
No |
No |
Local spots / selective |
Dow; Atotech; Umicore |
| GalvNiG soft |
Electroplated Nickel / Soft Gold |
Fine-gold electrolytes for bonding and soldering. Nickel hardness 400–450 HV; gold hardness 80–110 HV. |
Ni >4 µm; Au 0.20–0.50 µm |
No |
No |
>200% |
Dow; Atotech; Umicore |
| HAL lead free |
Lead-Free Hot Air Solder Leveling |
Also commonly called HAL or HASL; SnCuNi alloy coating. |
SnCuNi alloy 1–50 µm |
3× |
Yes |
70% |
Balver Zinn; Felder Lote |
| HAL lead containing |
Leaded Hot Air Solder Leveling |
Also commonly called HAL or HASL; SnPb alloy coating. |
SnPb alloy 1–50 µm |
3× |
Yes |
70% |
Balver Zinn; Felder Lote |
| IS |
Immersion Silver |
Thin, planar silver finish. Handling and packaging control are essential to avoid tarnish and contamination. |
Ag 0.20–0.40 µm |
3× |
No |
50% |
MacDermid; Umicore |
| ISIG |
Immersion Silver / Immersion Gold |
Silver followed by semireductive gold. |
Ag 0.20–0.30 µm; Au 0.04–0.15 µm |
3× |
No |
125% |
Umicore (TRG) |
| IT |
Immersion Tin |
Planar tin finish; susceptible to oxidation and requires controlled storage and assembly planning. |
Sn 0.80–1.30 µm |
3× |
Yes |
60% |
Atotech (Smarttin) |
| OSP |
Organic Solderability Preservative |
Organic surface passivation over copper; economical and flat, but process and handling limits apply. |
Organic coating 0.20–0.60 µm |
1–2× |
Yes |
30% |
Enthone (Entek+HT) |